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ELECTRONIC MATERIALS

Tosoh Finechem supplies electronic materials for advanced applications, including photoresist materials for semiconductors and high-purity organometallic compounds for display technologies.

Photo Resist Monomer
Etching Gas
MO-CVD Materials
Acid Generator

Photo Resist Monomer

Molecular Formula or Structural Formula

Product Name

Chemical Name

CAS No.

Detail

PACS

p-Acetoxystyrene

2628-16-2

PTBS

p-tert-Butoxystyrene

95418-58-9

PEES

p-(1-Ethoxyethoxy)styrene

157057-20-0

Etching Gas

Molecular Formula or Structural Formula

Product Name

Chemical Name

CAS No.

Detail

FITECT™ (CF3I)

Trifluoroiodomethane

2314-97-8

MO-CVD Materials

Molecular Formula or Structural Formula

Product Name

Chemical Name

CAS No.

Detail

EG-TMAL

Trimethylaluminum

75-24-1

EG-TMI

Trimethylindium

3385-78-2

Acid Generator

Molecular Formula or Structural Formula

Product Name

Chemical Name

CAS No.

Detail

S-PAG

Methyl 2,2-difluoro-
2-(fluorosulfonyl)acetate

680-15-9